activity
20102022
collaborators

6 papers

astro-ph.EP2022

In-situ wavelength calibration without a calibration target: use of Fraunhofer lines after landing on planetary surface

Shoki Mori, Ute Boettger, Maximilian Buder +14

Accurate wavelength calibration is critical for qualitative and quantitative spectroscopic measurements. Many spectrometers for planetary exploration are equipped with onboard cali…

physics.app-ph2020

Thermal activation of valley-orbit states of neutral magnesium in silicon

Rohan Abraham, Valentina Shuman, Leonid Portsel +7

Interstitial magnesium acts as a moderately deep double donor in silicon, and is relatively easily introduced by diffusion. Unlike the case of the chalcogen double donors, the bind…

cond-mat.mtrl-sci2019

Resolving isotope splitting of boron-related intracenter transitions in diamond by infrared absorption spectroscopy

Dmitrii Prikhodko, Sergey Pavlov, Sergey Tarelkin +7

Isotopic enrichment offers cutting-edge properties of materials opening exciting research and development opportunities. In semiconductors, reached progress of ultimate control in…

cond-mat.mtrl-sci2018

A Mg-pair isoelectronic bound exciton identified by its isotopic fingerprint in Si

Rohan Abraham, Adam DeAbreu, Kevin Morse +9

We use the greatly improved optical linewidths provided by highly enriched Si to study a photoluminescence line near 1017 meV previously observed in the luminescence spectru…

cond-mat.mtrl-sci2018

Further investigations of the deep double donor magnesium in silicon

Rohan Abraham, Adam DeAbreu, Kevin Morse +9

The deep double donor levels of substitutional chalcogen impurities in silicon have unique optical properties which may enable a spin/photonic quantum technology. The interstitial…

cond-mat.mes-hall2010

Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale

H. Bartolf, K. Inderbitzin, L. B. Gómez +6

We present results of a fabrication-process development for the lithographic pattern transfer into the sub-100nm range by combining electron-beam lithography and reactive dry etchi…