most citedNanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

9 citations · 9 across the 2 of their papers we have counts for

collaborators

3 papers

cond-mat.mes-hall2010

Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale

H. Bartolf, K. Inderbitzin, L. B. Gómez +6

We present results of a fabrication-process development for the lithographic pattern transfer into the sub-100nm range by combining electron-beam lithography and reactive dry etchi…

cond-mat.mes-hall2010★ 9 cited

Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

H. Bartolf, K. Inderbitzin, L. B. Gómez +2

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive…

cond-mat.supr-con2009

Current Assisted, Thermally Activated Flux Liberation in Ultrathin Nanopatterned NbN Superconducting Meander Structures

H. Bartolf, A. Engel, A. Schilling +4

We present results from an extensive study of fluctuation phenomena in superconducting nanowires made from sputtered NbN. Nanoscale wires were fabricated in form of a meander and o…