2 papers
cs.CV2026
MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning
Yuting Hu, Lei Zhuang, Chen Wang +4
As feature sizes shrink to the nanometer scale, accurately transferring circuit patterns from photomasks to silicon wafers becomes increasingly challenging. Optical proximity corre…
cs.LG2025
MaskOpt: A Large-Scale Mask Optimization Dataset to Advance AI in Integrated Circuit Manufacturing
Yuting Hu, Lei Zhuang, Hua Xiang +2
As integrated circuit (IC) dimensions shrink below the lithographic wavelength, optical lithography faces growing challenges from diffraction and process variability. Model-based o…