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researcher

L. Houben

5 papers hereh-index 489.6k citations240 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author4

Across the 4 of 5 papers where every author was matched, so the position is known.

fields
  • cond-mat.mes-hall2
  • cond-mat.mtrl-sci2
  • physics.app-ph1
same name
  • L. Houben — 2 papers, h 2

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20112020
most citedComprehensive characterization of an individual carbon nanotube transport device

4 citations · 9 across the 3 of their papers we have counts for

collaborators
Showing physics.app-phShow all

1 paper · 1 filter

physics.app-ph2020

Growth-Etch Metal-Organic Chemical Vapor Deposition Approach of WS2 Atomic-Layers

Assael Cohen, Avinash Patsha, Pranab K. Mohapatra +5

Metal organic chemical vapor deposition (MOCVD) is one of the main methodologies used for thin film fabrication in the semiconductor industry today and is considered one of the mos…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.