activity
20102023
most citedFeasibility study for the measurement of TDAs at PANDA in

32 citations · 57 across the 5 of their papers we have counts for

collaborators
Showing cond-mat.mtrl-sciShow all

1 paper · 1 filter

cond-mat.mtrl-sci2010

Grazing incidence interaction of Sn particles with EUV Lithography ruthenium mirrors

Valentino Rigato

The new EUV Lithography tools for IC High Volume Manufacture at 22nm make use of EUV radiation at λ= 13.5nm. High power Laser (LPP) and Discharge (DPP)EUV light sources are based o…