Surface-directed spinodal decomposition in the pseudobinary alloy (HfO_2)_x(SiO_2)_{1-x}

J. Liu, X. Wu, W. N. Lennard +2

Hf silicate films (HfO_2)_{0.25}(SiO_2)_{0.75} with thicknesses in the range 4-20 nm were grown on silicon substrate by atomic layer deposition at 350 deg.C.The Hf distributions in…