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cs.LG2026
LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching
Yao Lai, Xuyuan Xiong, Zeyue Xue +7
In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask. As circuit features shrink below the wavelength of light, optical…
cs.LG2026
TriAxialKV: Toward Extreme Low-Precision KV-Cache Quantization for Agentic Inference Tasks
Hanzhang Shen, Haoran Wu, Yiren Zhao +1
Agentic workloads have emerged as a major workload for LLM inference. They differ significantly from chat-only workloads, requiring long-context processing, the ability to handle m…