most citedNanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

9 citations · 9 across the 1 of their papers we have counts for

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1 paper

cond-mat.mes-hall2010★ 9 cited

Nanoscale Fabrication by Intrinsic Suppression of Proximity-Electron Exposures and General Considerations for Easy & Effective Top-Down Fabrication

H. Bartolf, K. Inderbitzin, L. B. Gómez +2

We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive…