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cond-mat.mes-hall2010★ 26 cited
Conducting Atomic Force Microscopy Studies of Nanoscale Cobalt Silicide Schottky Barriers on Si(111) and Si(100)
Joseph L. Tedesco, J. E. Rowe, Robert J. Nemanich
Cobalt silicide (CoSi2) islands have been formed by the deposition of thin films (~0.1 to 0.3 nm) of cobalt on clean Si(111) and Si(100) substrates in ultrahigh vacuum (UHV) follow…
cond-mat.mes-hall2010★ 11 cited
Titanium Silicide Islands on Atomically Clean Si(100): Identifying Single Electron Tunneling Effects
Joseph L. Tedesco, J. E. Rowe, Robert J. Nemanich
Titanium silicide islands have been formed by the ultrahigh vacuum deposition of thin films of titanium (< 2 nm) on atomically clean Si(100) substrates followed by annealing to ~80…