activity
20222025
most citedNon-zero crossing current-voltage characteristics of interface-type resistive switching devices

9 citations · 19 across the 11 of their papers we have counts for

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7 papers · 1 filter

physics.plasm-ph2025

Synergistic control of radical generation in a radio frequency atmospheric pressure plasma jet via voltage waveform tailoring and structured electrodes

Mate Vass, Xiaokun Wang, Ihor Korolov +2

The synergy between voltage waveform tailoring and structured electrodes is investigated in a radio-frequency (RF) atmospheric-pressure microplasma jet operated in helium with a 0.…

physics.plasm-ph2025

Electronegativity effects on plasma dynamics in He/O RF microplasma jets at atmospheric pressure

Lukas Vogelhuber, Ihor Korolov, Mate Vass +6

This work investigates the transitions between ohmic mode and Penning-Gamma mode in a capacitively coupled radio frequency micro atmospheric pressure plasma jets (CCRF APPJ) ope…

physics.plasm-ph2023

Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching

E. Jüngling, S. Wilczek, T. Mussenbrock +2

Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using…

physics.plasm-ph2023

Interactions between flow fields induced by surface dielectric barrier discharge arrays

Alexander Böddecker, Maximilian Passmann, Sebastian Wilczek +6

This study investigates the flow field induced by a surface dielectric barrier discharge (SDBD) system, known for its efficient pollution remediation of volatile organic compounds…

physics.plasm-ph2023

Nonlocal dynamics of secondary electrons in capacitively coupled radio frequency discharges

Katharina Noesges, Maximilian Klich, Aranka Derzsi +5

In capacitively coupled radio frequency (CCRF) discharges, the interaction of the plasma and the surface boundaries is linked to a variety of highly relevant phenomena for technolo…

physics.plasm-ph2023

Generation of energetic electrons by surface waves in VHF CCPs

D. Eremin, E. Kemaneci, M. Matsukuma +3

Capacitively coupled plasmas (CCP) comprise one of the main tool in active use in the plasma processing industry. However, increasing the driving frequency and electrode size is li…