2 papers
eess.SP2023
Applying Machine Learning Models on Metrology Data for Predicting Device Electrical Performance
Bappaditya Dey, Anh Tuan Ngo, Sara Sacchi +3
Moore Law states that transistor density will double every two years, which is sustained until today due to continuous multi-directional innovations, such as extreme ultraviolet li…
cs.CV2023
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
Sara Sacchi, Bappaditya Dey, Iacopo Mochi +2
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm…