most citedNovel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction

2 citations · 2 across the 1 of their papers we have counts for

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1 paper

cs.LG2024★ 2 cited

Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction

Mohamed S. E. Habib, Hossam A. H. Fahmy, Mohamed F. Abu-ElYazeed

Optical lithography is the main enabler to semiconductor manufacturing. It requires extensive processing to perform the Resolution Enhancement Techniques (RETs) required to transfe…