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cond-mat.mtrl-sci2026
Photoresist-Free Lithography via Light-Induced Redox Patterning of Oxide Thin Films
Johannes Frantti, Yukari Fujioka, Christopher Rouleau +2
Lithographic patterning of nanoscale devices typically depends on photoresists, wet processing and multistep pattern-transfer workflows that impose both environmental and scaling c…
cond-mat.mes-hall2026
Spontaneous Polarization Suppression of Exciton-Exciton Annihilation in 3R-Stacked MoS Bilayers
Tae Gwan Park, Xufan Li, Kyungnam Kang +4
Rapid exciton-exciton annihilation (EEA) in two-dimensional semiconductors limits access to high-density excitonic regimes essential for efficient optoelectronic operation under st…