2 papers
cond-mat.mtrl-sci2026
Catalytic precursor dissociation in Hot-Wire CVD and comparing a-Si:H growth under continuous and pulsed silane flow conditions
Swati Goyal, Karam Veer Singh, Rajiv O. Dusane +1
Hot-wire Chemical vapor deposition (HWCVD) of hydrogenated amorphous silicon (a-Si:H) thin films utilizes the dissociation of silane (SiH4) precursor over heated tungsten or tantal…
physics.app-ph2018
Ethanol and Hydrogen gas-sensing properties of CuO-CuFe2O4 nanostructured thin films
Saptarshi De, N. Venkataramani, Shiva Prasad +8
Nanocrystalline CuO-CuFe2O4 composite thin films were developed from CuFeO2 ceramic target using a radio frequency sputtering method followed by a thermal oxidation process. This f…