39 citations · 76 across the 5 of their papers we have counts for
5 papers
Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm
Qais Saadeh, Philipp Naujok, Vicky Philipsen +9
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film…
Reconstructing Detailed Line Profiles of Lamellar Gratings from GISAXS Patterns with a Maxwell Solver
Victor Soltwisch, Analia Fernandez Herrero, Mika Pflüger +5
Laterally periodic nanostructures were investigated with grazing incidence small angle X-ray scattering (GISAXS) by using the diffraction patterns to reconstruct the surface shape.…
Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations
S. Burger, L. Zschiedrich, J. Pomplun +4
EUV scatterometry is performed on 3D patterns on EUV lithography masks. Numerical simulations of the experimental setup are performed using a rigorous Maxwell solver. Mask geometry…
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
J. Pomplun, S. Burger, F. Schmidt +3
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) n…
Rigorous FEM-Simulation of EUV-Masks: Influence of Shape and Material Parameters
J. Pomplun, S. Burger, F. Schmidt +4
We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical pa…