4 papers
More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography
Fabian Holzmeier, Michiel J. van Setten, Ragnar Björnsson +3
Pentafluorophenyl triflate has been explored as a highly absorbing neutral photoacid generator (PAG) candidate for next generation chemically amplified resists used in extreme ultr…
Best Practices for First-Principles Modeling of Amorphous Oxide Semiconductors: A Statistical Framework and Application to Zn-Sn-O
Michiel J. van Setten, Tonglin L. Newsom, Christopher Pashartis +3
Ternary and quaternary amorphous oxide semiconductors have many properties that make them promising candidates for use in electronic applications like display, memory, and back end…
Photoemission Spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials
Faegheh S. Sajjadian, Laura Galleni, Kevin M. Dorney +5
Device architectures and dimensions are now at an unimaginable level not thought possible even 10 years ago. The continued downscaling, following the so-called Moore's law, has mot…
Computing Elastic Tensors of Amorphous Materials from First-Principles
C. Pashartis, M. J. van Setten, M. Houssa +1
Advancements in modern semiconductor devices increasingly depend on the utilization of amorphous materials and the reduction of material thickness, pushing the boundaries of their…