2 citations · 3 across the 3 of their papers we have counts for
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Wafer-scale detachable monocrystalline Germanium nanomembranes for the growth of III-V materials and substrate reuse
Nicolas Paupy, Zakaria Oulad Elhmaidi, Alexandre Chapotot +32
Germanium (Ge) is increasingly used as a substrate for high-performance optoelectronic, photovoltaic, and electronic devices. These devices are usually grown on thick and rigid Ge…
Dynamic formation of spherical voids crossing linear defects
Youcef A. Bioud, Maxime Rondeau, Abderraouf Boucherif +3
A predictive model for the evolution of porous Ge layer upon thermal treatment is reported. We represent an idealized etched dislocation core as an axially symmetric elongated hole…
Low cost Ge/Si virtual substrate through dislocation trapping by nanovoids
Youcef A. Bioud, Abderraouf Boucherif, Etienne Paradis +3
A low-cost method to reduce the threading disloca-tions density (TDD) in relaxed germanium (Ge) epilayers grown on silicon (Si) substrates is presented. Ge/Si sub-strate was treate…