2 papers
physics.optics2026
Antireflection by design in bilayer metasurfaces
Jaewon Oh, Davide Cassara, Alfonso Palmieri +5
Antireflection coatings are ubiquitous in optical systems, where they maximize transmission and suppress undesirable reflections by impedance-matching uniform interfaces. Extending…
cond-mat.mtrl-sci2025
Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists
Kevin M. Dorney, Ivan Pollentier, Fabian Holzmeier +11
Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufac…