2 papers
physics.optics2026
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
cond-mat.mes-hall2025
Van der Waals devices for surface-sensitive experiments
Nicolai Taufertshöfer, Corinna Burri, Rok Venturini +11
In-operando characterization of van der Waals (vdW) devices using surface-sensitive methods provides critical insights into phase transitions and correlated electronic states. Yet,…