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researcher

Y. Ando

61 papers hereh-index 272.1k citations163 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • first author8
  • middle author44
  • last author1

Across the 53 of 61 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci37
  • cond-mat.mes-hall15
  • physics.app-ph7
  • physics.acc-ph1
  • quant-ph1
same name
  • Y. Ando — 262 papers, h 73
  • Y. Ando — 17 papers, h 49
  • Y. Ando — 7 papers, h 12
  • Y. Ando — 7 papers, h 19
  • Y. Ando — 3 papers, h 4
  • Y. Ando — 1 paper, h 47

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20082026
most citedElectrical detection of the spin polarization due to charge flow in the surface state of the topological insulator Bi_1.5 Sb_0.5 Te_1.7 Se_1.3

164 citations · 1.9k across the 59 of their papers we have counts for

collaborators
Showing 2019 · physics.app-phShow all

3 papers · 2 filters

physics.app-ph2019★ 9 cited

Investigation of gating effect in Si spin MOSFET

Soobeom Lee, Fabien Rortais, Ryo Ohshima +6

A gate voltage application in a Si-based spin metal-oxide-semiconductor field-effect transistor (spin MOSFET) modulates spin accumulation voltages, where both electrical conductivi…

physics.app-ph2019★ 8 cited

Gate-tunable spin exclusive or operation in a silicon-based spin device at room temperature

R. Ishihara, Y. Ando, S. Lee +5

Room temperature operation of a spin exclusive or (XOR) gate was demonstrated in lateral spin valve devices with nondegenerate silicon (Si) channels. The spin XOR gate is a fundame…

physics.app-ph2019★ 19 cited

Monolayer MoS2 field effect transistor with low Schottky barrier height with ferromagnetic metal contacts

Sachin Gupta, F. Rortais, R. Ohshima +4

Two-dimensional MoS2 has emerged as promising material for nanoelectronics and spintronics due to its exotic properties. However, high contact resistance at metal semiconductor MoS…

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