Atom Probe Tomography as an Emerging Tool for Understanding Defect-driven Mechanisms in HfO${}_2$-based Ferroelectrics

Kasper A. Hunnestad, Catherine Dubourdieu, Alexei Gruverman +1

HfO${}_2$-based ferroelectrics are essential for the next generation of CMOS-compatible memory and logic devices, yet their performance is governed by a complex interplay between o…