SC-1 Etching of Niobium and Titanium Nitride Thin Films

Adrián Gutiérrez-Cruz, K. A. C. Rathnathilaka, Jani M. Taskinen +6

Dry etching techniques, ubiquitous in microelectronics fabrication, often result in challenging levels of undesired collateral plasma-induced damage. In this work, we demonstrate a…