2 papers
cond-mat.mtrl-sci2026
First Plasma Atomic Layer Etching of Diamond via O/Kr Chemistry
Duc Duy Tran, Cedric Mannequin, Aboulaye Traore +2
We report the first plasma atomic layer etching (ALE) process for diamond using a cyclic plasma sequence composed of two separated steps: oxygen surface modification and krypton io…
cond-mat.mtrl-sci2015
Potential barrier heights at metal on oxygen-terminated diamond interfaces
Pierre Muret, Aboulaye Traoré, Aurélien Maréchal +5
Electrical properties of metal-semiconductor (M/SC) and metal/oxide/SC structures built with Zr or ZrO\_2 deposited on oxygen-terminated surfaces of (001)-oriented diamond films, c…