2 citations · 3 across the 4 of their papers we have counts for
4 papers · 1 filter
Role of surface states and band modulations in ultrathin ruthenium interconnects
Gyungho Maeng, Subeen Lim, Mi Gyoung Lee +3
Mitigating the RC delay from transistor miniaturization is essential for next-generation devices, driving a focus on interconnect electrical performance. Current copper-based inter…
First-principles high-throughput screening of ruthenium compounds for advanced interconnects
Gyungho Maeng, Subeen Lim, Bonggeun Shong +1
As interconnect dimensions continue to shrink, the industry-standard copper faces a critical increase in resistivity, presenting a significant hurdle to overall device performance.…
Cobalt Binary Compounds for Advanced Interconnect Materials
Gyungho Maeng, Yeonghun Lee
The industrial standard copper (Cu) interconnects face a substantial resistivity increase at thinner linewidths, posing a well-known challenge to limit overall device performance.…
Validation of constant mean free path and relaxation time approximations for metal resistivity: explicit treatment of electron-phonon interactions
Subeen Lim, Yumi Kim, Gyungho Maeng +1
The figure of merit the product of resistivity and mean free path (MFP) evaluated from first-principles calculations, is widely adopted to screen promising interconnect metals…