activity
20032009
most citedOptimized Dynamical Decoupling in a Model Quantum Memory

656 citations · 656 across the 3 of their papers we have counts for

collaborators

6 papers

quant-ph2009

High-fidelity quantum control using ion crystals in a Penning trap

Michael J. Biercuk, Hermann Uys, Aaron P. VanDevender +3

We discuss the use of two-dimensional Be ion crystals for experimental tests of quantum control techniques. Our primary qubit is the 124 GHz ground-state electron spin…

quant-ph2009

Optimized Noise Filtration through Dynamical Decoupling

Hermann Uys, Michael J. Biercuk, John J. Bollinger

One approach to maintaining phase coherence of qubits through dynamical decoupling consists of applying a sequence of Hahn spin-echo pulses. Recent studies have shown that, in cert…

quant-ph2009656 cited

Optimized Dynamical Decoupling in a Model Quantum Memory

Michael J. Biercuk, Hermann Uys, Aaron P. VanDevender +3

We present experimental measurements on a model quantum system that demonstrate our ability to dramatically suppress qubit error rates by the application of optimized dynamical dec…

cond-mat.mes-hall2005

Charge sensing in carbon nanotube quantum dots on microsecond timescales

M. J. Biercuk, D. J. Reilly, T. M. Buehler +4

We report fast, simultaneous charge sensing and transport measurements of gate-defined carbon nanotube quantum dots. Aluminum radio frequency single electron transistors (rf-SETs)…

cond-mat.mes-hall2004

Anomalous Conductance Quantization in Carbon Nanotubes

M. J. Biercuk, N. Mason, J. Martin +2

Conductance measurements of carbon nanotubes containing gated local depletion regions exhibit plateaus as a function of gate voltage, spaced by approximately e2/h, the quantum of c…

cond-mat.mes-hall2003

A Low-Temperature Atomic Layer Deposition Liftoff Method for Microelectronic and Nanoelectronic Applications

M. J. Biercuk, D. J. Monsma, C. M. Marcus +2

We report a novel method for depositing patterned dielectric layers with sub-micron features using atomic layer deposition (ALD). The patterned films are superior to sputtered or e…