236 citations · 358 across the 4 of their papers we have counts for
4 papers
A model for pressurized hydrogen induced thin film blisters
R. A. J. M. van den Bos, V. Reshetniak, C. J. Lee +2
We introduce a model for hydrogen induced blister formation in nanometer thick thin films. The model assumes that molecular hydrogen gets trapped under a circular blister cap causi…
Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source
A Dolgov, D Lopaev, C J Lee +4
Molecular contamination of a grazing incidence collector for extreme ultraviolet (EUV) lithography was experimentally studied. A carbon film was found to have grown under irradiati…
High confinement, high yield Si3N4 waveguides for nonlinear optical application
Jörn P. Epping, Marcel Hoekman, Richard Mateman +6
In this paper we present a novel fabrication technique for silicon nitride (Si3N4) waveguides with a thickness of up to 900 nm, which are suitable for nonlinear optical application…
Graphene defect formation by extreme ultraviolet generated photoelectrons
A. Gao, C. J. Lee, F. Bijkerk
We have studied the effect of photoelectrons on defect formation in graphene during extreme ultraviolet (EUV) irradiation. Assuming the major role of these low energy electrons, we…