Sela Murphy

most citedAtomic layer etching of niobium nitride using sequential exposures of O

_{2}

and H

_{2}

/SF

_{6}

plasmas

2 citations · 2 across the 1 of their papers we have counts for

collaborators

1 paper

cond-mat.mtrl-sci2025★ 2 cited

Atomic layer etching of niobium nitride using sequential exposures of O $_{2}$ and H $_{2}$ /SF $_{6}$ plasmas

Azmain A. Hossain, Sela Murphy, David S. Catherall +2

Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature ( $T_{c}$ ) and kinetic inductance. Proces…

Atomic layer etching of niobium nitride using sequential exposures of O2​ and H2​/SF6​ plasmas

Atomic layer etching of niobium nitride using sequential exposures of O $_{2}$ and H $_{2}$ /SF $_{6}$ plasmas