most citedModeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

30 citations · 30 across the 1 of their papers we have counts for

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1 paper

physics.plasm-ph2008★ 30 cited

Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

D. A. Ariskin, I. V. Schweigert, A. L. Alexandrov +2

We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid…