1 citations · 1 across the 2 of their papers we have counts for
3 papers
Holographic EUV Lithography at 40 nm Resolution
Ziqi Li, Iason Giannopoulos, Lisong Dong +7
Extreme ultraviolet (EUV) lithography is the cornerstone of the fabrication of advanced integrated circuits at the 7-nm node and beyond, but its reliance on multi-element reflectiv…
Van der Waals devices for surface-sensitive experiments
Nicolai Taufertshöfer, Corinna Burri, Rok Venturini +11
In-operando characterization of van der Waals (vdW) devices using surface-sensitive methods provides critical insights into phase transitions and correlated electronic states. Yet,…
Extreme ultraviolet lithography reaches 5 nm resolution
Iason Giannopoulos, Iacopo Mochi, Michaela Vockenhuber +2
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development…