Leakage Suppression Across Temperature in Al1-xScxN Thin Film Ferroelectric Capacitors through Boron Incorporation

Pedram Yousefian, Xiaolei Tong, Jonathan Tan +3

This paper presents high-temperature ferroelectric characterization of 40~nm Al${}_{1-x-y}$B${}_x$Sc${}_y$N (AlBScN) thin film capacitors grown by co-sputtering Al${}_{0.89}$B${}_{0.11}$ and…