most citedFundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists

3 citations · 3 across the 1 of their papers we have counts for

collaborators

1 paper

cond-mat.mtrl-sci2025★ 3 cited

Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists

Kevin M. Dorney, Ivan Pollentier, Fabian Holzmeier +11

Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufac…