2 papers
physics.optics2025
Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning
Tong Li, Yuqing Chen, Yanqiu Li +1
Using the illuminator for high numerical aperture (NA) extreme ultraviolet (EUV) exposure tool in EUV lithography can lead to support volume production of sub-2 nm logic nodes and…
cs.HC2024
Visual Harmony: Text-Visual Interplay in Circular Infographics
Shuqi He, Yuqing Chen, Yuxin Xia +3
Infographics are visual representations designed for efficient and effective communication of data and knowledge. One crucial aspect of infographic design is the interplay between…