collaborators

1 paper

physics.optics2026

40% boost in extreme ultraviolet conversion efficiency via simultaneous dual-beam 2-μm laser irradiation

Naoki Nagahama, Kaito Nishimiya, Shunya Yamamoto +9

Scaling extreme ultraviolet (EUV) source power for next-generation lithography demands higher conversion efficiency (CE) at reduced per-pulse energies. We demonstrated a 40% CE enh…