4 papers
A Two-Mirror Faceted Projection System for EUV Lithography
Vasiliy A. Es'kin, Egor V. Ivanov, Olga V. Martynova
We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of ~nm (Mo/Si) and ~nm (Ru/Be), de…
Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator
Vasiliy A. Es'kin, Egor V. Ivanov
Gradient-based inverse lithography technology~(ILT) for extreme ultraviolet~(EUV) masks is presented. A novel framework treats the differentiable waveguide method and the recently…
Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask
Vasiliy A. Es'kin, Egor V. Ivanov
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from contemporary lith…
Physics-informed neural networks and neural operators for a study of EUV electromagnetic wave diffraction from a lithography mask
Vasiliy A. Es'kin, Egor V. Ivanov
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from a mask are presen…