Hexagonal boron nitride thin film synthesis with a ns-pulsed MHCD: in-situ plasma diagnostics and post-growth film characterization

Belkacem Menacer, Dimitrios Stefas, Nikolaos Chazapis +3

Hexagonal boron nitride (h-BN) is deposited on Si <100> wafer ($\approx$20 cm2) via Plasma Enhanced Chemical Vapor Deposition (PECVD) using a ns-pulsed N2/Ar Micro Hollow Cathode D…