2 papers
cs.CV2026
Failure-Aware Refinement of Vision-Language Model for Lithography Defect Detection
Pangyun Jeong, Jiyeong Kong, Yuehua Hu +2
Semiconductor lithography inspection requires reliable detection of small pattern defects such as bridge, burr, pinch, and contamination. In this study, we propose a two-stage visi…
cs.CV2025
A Physics-Constrained, Design-Driven Methodology for Defect Dataset Generation in Optical Lithography
Yuehua Hu, Jiyeong Kong, Dong-yeol Shin +2
The efficacy of Artificial Intelligence (AI) in micro/nano manufacturing is fundamentally constrained by the scarcity of high-quality and physically grounded training data for defe…