activity
20242026
most citedTime performance of Analog Pixel Test Structures with in-chip operational amplifier implemented in 65 nm CMOS imaging process

5 citations · 5 across the 3 of their papers we have counts for

collaborators

5 papers

nucl-ex2026

Investigation of hadronic effects on resonance productions in small collision systems using the EPOS4 model

Hyunji Lim, Bong-Hwi Lim, Minjung Kim +1

Recent experimental results in high-multiplicity proton-proton (pp) collisions have suggested the possible emergence of collective behavior and medium-like effects previously consi…

physics.ins-det2025

Influence of Radiation and AC Coupling on Time Performance of Analog Pixels Test Structures in 65 nm CMOS technology

Gianluca Aglieri Rinella, Luca Aglietta, Matias Antonelli +44

Monolithic Active Pixel Sensors (MAPS) in advanced CMOS imaging technologies are key to next-generation tracking systems for high-energy physics, where radiation hardness and preci…

physics.ins-det2025

Characterisation of the first wafer-scale prototype for the ALICE ITS3 upgrade: the monolithic stitched sensor (MOSS)

Omar Abdelrahman, Gianluca Aglieri Rinella, Luca Aglietta +136

This paper presents the characterisation and testing of the first wafer-scale monolithic stitched sensor (MOSS) prototype developed for the ALICE ITS3 upgrade that is to be install…

nucl-th2025

Exploring hadronic rescattering effects on resonance productions in pp and p-Pb collisions with PYTHIA8

Su-Jeong Ji, Gyeongbin Park, Bong-Hwi Lim +1

In relativistic heavy-ion collisions, the quark-gluon plasma is created, and as the medium cools down, the system transitions into a hadronic phase. While such interactions are wel…

physics.ins-det2024★ 5 cited

Time performance of Analog Pixel Test Structures with in-chip operational amplifier implemented in 65 nm CMOS imaging process

Gianluca Aglieri Rinella, Luca Aglietta, Matias Antonelli +43

In the context of the CERN EP R&D on monolithic sensors and the ALICE ITS3 upgrade, the Tower Partners Semiconductor Co (TPSCo) 65 nm process has been qualified for use in high ene…