Demonstration of Si-doped Al-rich thin regrown Al(Ga)N films on AlN on sapphire templates with $>10^{15}/c{m}^3$ free carrier concentration using close-coupled showerhead MOCVD reactor

Swarnav Mukhopadhyay, Parthasarathy Seshadri, Mobinul Haque +6

Thin Si-doped Al-rich (Al>0.85) regrown Al(Ga)N layers were deposited on AlN on Sapphire template using metal-organic chemical vapor deposition (MOCVD) techniques. The optimization…