Anthony J. Ardizzi

activity

20232025

_{2}

using sequential exposures of Al(CH

_{3}

)

_{3}

and H

_{2}

/SF

_{6}

plasma

12 citations · 15 across the 6 of their papers we have counts for

collaborators

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cond-mat.mes-hall2023★ 1 cited

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas

Ivy I. Chen, Jennifer Solgaard, Ryoto Sekine +7

Lithium niobate (LiNbO $_{3}$ , LN) is a ferroelectric crystal of interest for integrated photonics owing to its large second-order optical nonlinearity and the ability to impart perio…

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H2​ and SF6​ plasmas

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas