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stat.OT2025
Data-driven inverse uncertainty quantification: application to the Chemical Vapor Deposition Reactor Modeling
Geremy Loachamín, Eleni D. Koronaki, Dimitrios G. Giovanis +4
This study presents a Bayesian framework for (inverse) uncertainty quantification and parameter estimation in a two-step Chemical Vapor Deposition coating process using production…
physics.app-ph2025
CFD Modelling and Sensitivity-Guided Design of Silicon Filament CVD Reactors
G. P. Gakis, G. Loachamín-Suntaxi, I. G. Aviziotis +6
Filament-based chemical vapor deposition (CVD) for silicon (Si) coatings is often treated as a straightforward adaptation of planar deposition, just with a cylindrical substrate. B…