J. R. Renzas

collaborators

3 papers

cond-mat.mtrl-sci2025

Directional atomic layer etching of MgO-doped lithium niobate using Br-based plasma

Ivy I. Chen, Mariya Ezzy, Emily Hsue-Chi Shi +8

Lithium niobate (LiNbO $_{3}$ , LN) is a nonlinear optical material of high interest for integrated photonics with applications ranging from optical communications to quantum informati…

cond-mat.mes-hall2023

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas

Ivy I. Chen, Jennifer Solgaard, Ryoto Sekine +7

Lithium niobate (LiNbO $_{3}$ , LN) is a ferroelectric crystal of interest for integrated photonics owing to its large second-order optical nonlinearity and the ability to impart perio…

cond-mat.mes-hall2023

Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SF $_{6} /$ H $_{2}$ plasma

Azmain A. Hossain, Haozhe Wang, David S. Catherall +4

Microwave loss in superconducting titanium nitride (TiN) films is attributed to two-level systems in various interfaces arising in part from oxidation and microfabrication-induced…

Directional atomic layer etching of MgO-doped lithium niobate using Br-based plasma

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H2​ and SF6​ plasmas

Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SF6​/H2​ plasma

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas

Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SF $_{6} /$ H $_{2}$ plasma