Yi-Fan Zhang

collaborators

2 papers

physics.plasm-ph2026

The effect of surface quenching coefficients of $O_{2} (a^{1} Δ g)$ and $O_{2} (b^{1} Σ g^{+})$ on capacitively coupled $A r$ / $O_{2}$ discharge: A global/equivalent circuit model study

Wan Dong, Yi Wang, Yi-Fan Zhang +1

Capacitively coupled discharges operated in mixtures of $A r$ and $O_{2}$ are extensively utilized in plasma etching and deposition processes due to the oxidative properties and precu…

physics.plasm-ph2024

Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms

Wan Dong, Liu-Qin Song, Yi-Fan Zhang +3

The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3 plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional fluid/Mont…

The effect of surface quenching coefficients of O2​(a1Δg) and O2​(b1Σg+) on capacitively coupled Ar/O2​ discharge: A global/equivalent circuit model study

Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms

The effect of surface quenching coefficients of $O_{2} (a^{1} Δ g)$ and $O_{2} (b^{1} Σ g^{+})$ on capacitively coupled $A r$ / $O_{2}$ discharge: A global/equivalent circuit model study