2 papers
cond-mat.mes-hall2026
Contacts to Low-Dimensional Semiconductors: Physical Theory and Analytical Model
Jimmy Qin, H. -S. Philip Wong
Metal contacts to low-dimensional semiconductors are critical for nanoelectronics, yet a general physical description has remained elusive. We present an analytical model for metal…
cond-mat.mtrl-sci2025
Gate Dielectric Engineering with an Ultrathin Silicon-oxide Interfacial Dipole Layer for Low-Leakage Oxide-Semiconductor Memories
Fabia F. Athena, Jonathan Hartanto, Matthias Passlack +11
We demonstrate a gate dielectric engineering approach leveraging an ultrathin, atomic layer deposited (ALD) silicon oxide interfacial layer (SiL) between the amorphous oxide semico…