David S. Catherall

activity

20242026

collaborators

3 papers

cond-mat.mtrl-sci2026

Characterization of ultrathin nickel films deposited by thermal laser evaporation

David S. Catherall, Yifei Yan, Finley B. Donachie +2

Thermal laser evaporation is a physical vapor deposition technique of increasing interest because of its ability to evaporate essentially any solid element, even the most refractor…

cond-mat.mtrl-sci2025

Atomic layer etching of niobium nitride using sequential exposures of O $_{2}$ and H $_{2}$ /SF $_{6}$ plasmas

Azmain A. Hossain, Sela Murphy, David S. Catherall +2

Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature ( $T_{c}$ ) and kinetic inductance. Proces…

cond-mat.mes-hall2024

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas

Ivy I. Chen, Jennifer Solgaard, Ryoto Sekine +7

Lithium niobate (LiNbO $_{3}$ , LN) is a ferroelectric crystal of interest for integrated photonics owing to its large second-order optical nonlinearity and the ability to impart perio…

Characterization of ultrathin nickel films deposited by thermal laser evaporation

Atomic layer etching of niobium nitride using sequential exposures of O2​ and H2​/SF6​ plasmas

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H2​ and SF6​ plasmas

Atomic layer etching of niobium nitride using sequential exposures of O $_{2}$ and H $_{2}$ /SF $_{6}$ plasmas

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H $_{2}$ and SF $_{6}$ plasmas