2 papers
cond-mat.mtrl-sci2025
A Computational Study for Screening High-Selectivity Inhibitors in Area-Selective Atomic Layer Deposition on Amorphous Surfaces
Gijin Kim, Purun-hanul Kim, Suk Gyu Hahm +4
Area-selective atomic layer deposition (AS-ALD) is an emerging technology in semiconductor manufacturing. However, accurately understanding inhibitor reactivity on surfaces remains…
cond-mat.mtrl-sci2025
Neural Network-Driven Molecular Insights into Alkaline Wet Etching of GaN: Toward Atomistic Precision in Nanostructure Fabrication
Purun-hanul Kim, Jeong Min Choi, Seungwu Han +1
We present large-scale molecular dynamics (MD) simulations based on a machine-learning interatomic potential to investigate the wet etching behavior of various GaN facets in alkali…