3 papers
Electrical characterization of gadolinium oxide deposited by high pressure sputtering with in situ plasma oxidation
MarÃa Ãngela Pampillón, Pedro Carlos Feijoo, Enrique San Andrés
In this work, we characterized gadolinium oxide films deposited on silicon by high pressure sputtering with a two-step process: first, we sputtered metallic gadolinium in an argon…
High Pressure Sputtering For Kigh-k Dielectric Deposition. Is It Worth Trying?
Enrique San Andrés, Pedro Carlos Feijoo, MarÃa Ãngela Pampillón +2
Our research group studies the deposition of high permittivity dielectrics by a non-standard method: high-pressure sputtering. The dielectrics studied here are gadolinium scandate…
Optimization of gadolinium oxide growth deposited on Si by high pressure sputtering
Pedro Carlos Feijoo, MarÃa Ãngela Pampillón, Enrique San Andrés
High k gadolinium oxide thin layers were deposited on silicon by high-pressure sputtering (HPS). In order to optimize the properties for microelectronic applications, different dep…