7 citations · 18 across the 10 of their papers we have counts for
4 papers · 1 filter
A Two-Mirror Faceted Projection System for EUV Lithography
Vasiliy A. Es'kin, Egor V. Ivanov, Olga V. Martynova
We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of ~nm (Mo/Si) and ~nm (Ru/Be), de…
Gradient-based inverse lithography for EUV masks via the waveguide method and a physics-informed neural operator
Vasiliy A. Es'kin, Egor V. Ivanov
Gradient-based inverse lithography technology~(ILT) for extreme ultraviolet~(EUV) masks is presented. A novel framework treats the differentiable waveguide method and the recently…
Dynamical Systems Theory Behind a Hierarchical Reasoning Model
Vasiliy A. Es'kin, Mikhail E. Smorkalov
Current large language models (LLMs) primarily rely on linear sequence generation and massive parameter counts, yet they severely struggle with complex algorithmic reasoning. While…
Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask
Vasiliy A. Es'kin, Egor V. Ivanov
Physics-informed neural networks (PINNs) and neural operators (NOs) for solving the problem of diffraction of Extreme Ultraviolet (EUV) electromagnetic waves from contemporary lith…