A Two-Mirror Faceted Projection System for EUV Lithography

Vasiliy A. Es'kin, Egor V. Ivanov, Olga V. Martynova

We propose an all-reflective two-mirror projection system for extreme ultraviolet (EUV) lithography operating at exposure wavelengths of $13.5$~nm (Mo/Si) and $11.2$~nm (Ru/Be), de…