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cs.LG2019★ 1 cited
Deep Learning Regression of VLSI Plasma Etch Metrology
Jack Kenney, John Valcore, Scott Riggs +1
In computer chip manufacturing, the study of etch patterns on silicon wafers, or metrology, occurs on the nano-scale and is therefore subject to large variation from small, yet sig…
physics.flu-dyn2019
Unsupervised Machine Learning to Teach Fluid Dynamicists to Think in 15 Dimensions
S. M. de Bruyn Kops, D. J. Saunders, E. A. Rietman +1
An autoencoder is used to compress and then reconstruct three-dimensional stratified turbulence data in order to better understand fluid dynamics by studying the errors in the reco…