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20232026
most citedScalable Parallel Algorithm for Graph Neural Network Interatomic Potentials in Molecular Dynamics Simulations

222 citations · 229 across the 18 of their papers we have counts for

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Showing 2025 · cond-mat.mtrl-sciShow all

11 papers · 2 filters

cond-mat.mtrl-sci2025★ 3 cited

Optimizing Cross-Domain Transfer for Universal Machine Learning Interatomic Potentials

Jaesun Kim, Jinmu You, Yutack Park +11

Accurate yet transferable machine-learning interatomic potentials (MLIPs) are essential for accelerating materials and chemical discovery. However, most universal MLIPs overfit to…

cond-mat.mtrl-sci2025

A Computational Study for Screening High-Selectivity Inhibitors in Area-Selective Atomic Layer Deposition on Amorphous Surfaces

Gijin Kim, Purun-hanul Kim, Suk Gyu Hahm +4

Area-selective atomic layer deposition (AS-ALD) is an emerging technology in semiconductor manufacturing. However, accurately understanding inhibitor reactivity on surfaces remains…

cond-mat.mtrl-sci2025

Are diffusion models ready for materials discovery in unexplored chemical space?

Sanghyun Kim, Gihyeon Jeon, Seungwoo Hwang +4

While diffusion models are attracting increasing attention for the design of novel materials, their ability to generate low-energy structures in unexplored chemical spaces has not…

cond-mat.mtrl-sci2025

Discovery of oxide Li-conducting electrolytes in uncharted chemical space via topology-constrained crystal structure prediction

Seungwoo Hwang, Jiho Lee, Seungwu Han +2

Oxide Li-conducting solid-state electrolytes (SSEs) offer excellent chemical and thermal stability but typically exhibit lower ionic conductivity than sulfides and chlorides. This…

cond-mat.mtrl-sci2025

Atomistic insights into hydrogen migration in IGZO from machine-learning interatomic potential: linking atomic diffusion to device performance

Hyunsung Cho, Minseok Moon, Jaehoon Kim +6

Understanding hydrogen diffusion is critical for improving the reliability and performance of oxide thin-film transistors (TFTs), where hydrogen plays a key role in carrier modulat…

cond-mat.mtrl-sci2025

Etching-to-deposition transition in SiO/SiN using CHF ion-based plasma etching: An atomistic study with neural network potentials

Hyungmin An, Sangmin Oh, Dongheon Lee +4

Plasma etching, a critical process in semiconductor fabrication, utilizes hydrofluorocarbons both as etchants and as precursors for carbon film formation, where precise control ove…